In-seon Park

Title: In-seon Park: Innovator in Semiconductor Capacitor Technology

Introduction

In-seon Park is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of capacitors. With a total of 9 patents to his name, Park's work has been instrumental in advancing the efficiency and performance of semiconductor devices.

Latest Patents

Park's latest patents focus on methods for forming capacitors in semiconductor devices. One notable patent describes a capacitor that utilizes a silicon-containing conductive layer as a storage node. This innovative design includes a storage node, an amorphous Al2O3 dielectric layer, and a plate node. The amorphous Al2O3 layer is created using reactive vapor phase materials, specifically through an atomic layered deposition method. Additionally, the storage node undergoes rapid thermal nitridation prior to the formation of the amorphous Al2O3 layer. The densification of the amorphous Al2O3 layer is achieved through annealing at approximately 850°C, which allows for an equivalent oxide layer thickness that approaches the theoretical value of 30 Å.

Career Highlights

In-seon Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the semiconductor field. His work has not only contributed to the company's advancements but has also set new standards in capacitor technology.

Collaborations

Park has collaborated with notable colleagues, including Yeong-kwan Kim and Sang-min Lee, who have also contributed to the research and development of semiconductor technologies.

Conclusion

In-seon Park's contributions to semiconductor capacitor technology exemplify the impact of innovative thinking in the electronics industry. His patents and ongoing work at Samsung Electronics Co., Ltd. continue to shape the future of semiconductor devices.