Gyeonggi-do, South Korea

In-Mun Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Milaebo Co., Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: In-Mun Hwang. Retrieved from https://idiyas.com/inventor/in-mun-hwang-e0br91wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: In-Mun Hwang: Innovator in Semiconductor Technology

Introduction

In-Mun Hwang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent that addresses the challenges of byproduct collection during the manufacturing process.

Latest Patents

Hwang holds a patent for a "Byproduct Collecting Apparatus of Semiconductor Apparatus." This invention provides an efficient solution for collecting reaction byproducts contained in exhaust gas emitted from a process chamber during semiconductor manufacturing. The apparatus features a housing with a gas inlet and outlet port, along with a trap module designed to guide the exhaust gas flow in a curved manner using first plates that are either curved or inclined.

Career Highlights

In-Mun Hwang has dedicated his career to advancing semiconductor technology. His work has been instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes. He is currently associated with Milaebo Co., Ltd., where he continues to innovate and contribute to the industry.

Collaborations

Hwang collaborates with talented individuals such as Che-Hoo Cho and Jung-Eui Hong, who share his commitment to advancing technology in the semiconductor field.

Conclusion

In-Mun Hwang's contributions to semiconductor technology through his innovative patent demonstrate his expertise and dedication to improving manufacturing processes. His work not only enhances efficiency but also sets a standard for future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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