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For the Inventor, By the Inventor

Yongin-si, South Korea

In-kyun Shin

USPTO Granted Patents = 13 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Seoul, KR (1998)
  • Kyungki-Do, KR (2005)
  • Yongin-si, KR (2008 - 2018)

Company Filing History:

goldMedal13 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 1998-2018

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13 patents (USPTO):Explore Patents
1. 10012900 - Method of correcting mask pattern and method of manufacturing reticle (2018-07-03),
2. 9671686 - Exposure methods using e-beams and methods of manufacturing masks and semiconductor devices therefrom (2017-06-06),
3. 9583305 - Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same (2017-02-28),
4. 8795929 - Pellicle having buffer zone and photomask structure having pellicle (2014-08-05),
5. 7541118 - Phase shift mask (2009-06-02),
6. 7432022 - Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same (2008-10-07),
7. 7387965 - Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same (2008-06-17),
8. 7338736 - Method of fabricating a phase shift mask (2008-03-04),
9. 7335449 - Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same (2008-02-26),
10. 6919149 - Wave guided alternating phase shift mask and fabrication method thereof (2005-07-19),
11. 5853921 - Methods of fabricating phase shift masks by controlling exposure doses (1998-12-29),
12. 5814424 - Half tone phase shift masks with staircase regions and methods of (1998-09-29),
13. 5741613 - Methods of forming half-tone phase-shift masks with reduced (1998-04-21),

Title: In-kyun Shin: Innovator in Semiconductor Technology

Introduction

In-kyun Shin is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His innovative work focuses on methods that enhance the manufacturing processes of reticles and masks used in semiconductor devices.

Latest Patents

Among his latest patents, In-kyun Shin has developed a method of correcting mask patterns and a method of manufacturing reticles. The method of manufacturing a reticle involves preparing a substrate, determining position data of a pattern to be formed, and setting primary exposure conditions. It includes performing primary exposure simulations and calculating deformation rates to correct position data for optimal pattern formation. Additionally, he has disclosed exposure methods using e-beams, which minimize time taken by mask data preparation and enhance pattern quality through complex corrections.

Career Highlights

In-kyun Shin is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in improving the efficiency and quality of semiconductor manufacturing processes.

Collaborations

He collaborates with notable colleagues, including Jin Hyeock Choi and Seong-yong Moon, who contribute to his innovative projects and research endeavors.

Conclusion

In-kyun Shin's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a leading inventor in the industry. His work continues to influence advancements in manufacturing processes, ensuring higher quality and efficiency in semiconductor devices.

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