Daejeon Metropolitan, South Korea

In Ho Hwang

This inventor holds 31 USPTO granted patents and 2 published patent applications and 20 EPO patents, primarily in Adhesive Technology. Top assignees: Lg Chem, Ltd, Electronics and Telecommunications Research Institute, Sunic Systems, Ltd.. Active years: 2010-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: In Ho Hwang. Retrieved from https://idiyas.com/inventor/in-ho-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31 

% Patents Active = 96.8

 

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 22(Granted Patents)


Location History:

  • Daejeon Metropolitan, KR (2010 - 2011)
  • Gyeonggi-do, KR (2016 - 2017)
  • Daejeon, KR (2010 - 2019)

Company Filing History:


Years Active: 2010-2019

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Areas of Expertise:
Pressure-Sensitive Adhesive
Polarizing Plate
Liquid Crystal Display
Organic Material Deposition
Optical Film
Eavesdropping Prevention
Polymer Composition
Thin Film
31 patents (USPTO):Explore Patents

Title: **In Ho Hwang: Innovator in Pressure-Sensitive Adhesive Technologies**

Introduction

In Ho Hwang, based in Daejeon Metropolitan, Korea, is a notable inventor recognized for his contributions to the field of adhesive technologies. With a remarkable portfolio of 31 patents, Hwang has significantly advanced the practical applications of pressure-sensitive adhesives, addressing various challenges in durability and performance under extreme conditions.

Latest Patents

Among Hwang's latest patents is a groundbreaking pressure-sensitive adhesive composition that enhances the performance of polarizing plates and liquid crystal display devices. This innovative composition is designed to withstand high temperature and humidity, ensuring reliability even in extreme environments. Furthermore, it exhibits superior workability, which enhances cuttability and re-workability. When applied to large display devices of 20 inches or more, this adhesive composition effectively prevents light leakage, showcasing its excellent characteristics.

Another patent focuses on a pressure-sensitive adhesive composition that demonstrates exceptional storage stability and optimized peel-off strengths. This adhesive not only provides a protective effect when used with protective films but also facilitates a high-speed process with an excellent antistatic property during application.

Career Highlights

Hwang has had a distinguished career, contributing his expertise to renowned organizations such as LG Chem, Ltd. and the Electronics and Telecommunications Research Institute. His role in these companies underscores his commitment to innovation in adhesive technology and its applications in electronic devices.

Collaborations

Throughout his career, In Ho Hwang has collaborated with notable colleagues including No Ma Kim and Sung Soo Yoon. These partnerships have fostered an environment of innovation and have led to the development of advanced adhesive solutions that benefit various industries.

Conclusion

In Ho Hwang's body of work exemplifies the importance of advancements in pressure-sensitive adhesives, driving forward the capabilities of modern electronic devices. His achievements highlight the interplay between innovation and industry needs, paving the way for future developments that enhance product performance and user experience.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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