Daejeon, South Korea

In Bae Kim

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Display Co., Ltd.. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: In Bae Kim. Retrieved from https://idiyas.com/inventor/in-bae-kim-6j5ud9ja

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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2 patents (USPTO):Explore Patents

Title: In Bae Kim: Innovator in Deposition Mask Technology

Introduction

In Bae Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of deposition mask technology, holding two patents that showcase his innovative approach to manufacturing processes.

Latest Patents

His latest patents focus on a method of manufacturing a deposition mask. This method involves preparing a mask-target substrate with a sacrificed layer pattern. The substrate includes a cover area covered by the sacrificed layer pattern and several exposed areas. The process entails forming holes in the exposed areas by emitting laser toward the mask-target substrate. After this, the sacrificed layer pattern is removed, which has a higher reflectance with respect to the laser than the mask-target substrate itself.

Career Highlights

In Bae Kim is currently employed at Samsung Display Co., Ltd., where he continues to develop and refine his innovative techniques. His work has contributed to advancements in display technologies, enhancing the efficiency and effectiveness of manufacturing processes.

Collaborations

He collaborates with talented coworkers, including Hwi Dae Kim and Sung Soon Im, who contribute to the innovative environment at Samsung Display Co., Ltd.

Conclusion

In Bae Kim's contributions to deposition mask technology exemplify the spirit of innovation in the field. His patents reflect a commitment to advancing manufacturing techniques, making a significant impact in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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