The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

May. 11, 2022
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Hwi Kim, Suwon-si, KR;

In Bae Kim, Daejeon, KR;

Sung Soon Im, Suwon-si, KR;

Kyu Hwan Hwang, Seongnam-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 16/04 (2006.01); H10K 50/00 (2023.01); H10K 71/00 (2023.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 16/042 (2013.01); H10K 50/00 (2023.02); H10K 71/00 (2023.02); H10K 71/166 (2023.02);
Abstract

A method of manufacturing a deposition mask includes preparing a mask-target substrate which has one surface on which a sacrificed layer pattern is formed and comprises a cover area covered by the sacrificed layer pattern and a plurality of exposed areas exposed by the sacrificed layer pattern; forming holes in the exposed areas of the mask-target substrate by emitting laser toward the mask-target substrate; and removing the sacrificed layer pattern, wherein the sacrificed layer pattern has a higher reflectance with respect to the laser than a reflectance of the mask-target substrate.


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