Company Filing History:
Years Active: 2008-2009
Title: Ilya Golubtsov: Innovator in Geometric Point Recognition and OPC Mask Quality Analysis
Introduction
Ilya Golubtsov is a prominent inventor based in Moscow, Russia. He has made significant contributions to the field of integrated circuit design, particularly in the areas of geometric point recognition and optical proximity correction (OPC) mask quality analysis. With a total of 2 patents, Golubtsov's work has advanced the methodologies used in semiconductor manufacturing.
Latest Patents
Golubtsov's latest patents include a method for automatic recognition of geometric points in a target IC design for OPC mask quality calculation. This innovative system allows for the automatic identification of geometric features in a target design, facilitating the calculation of mask quality. The method involves traversing x, y points of features and connecting neighboring pairs to define segments. By analyzing the physical characteristics of these segments, quality measuring points can be determined based on their lengths.
Another notable patent is a method and system for analyzing the quality of an OPC mask. This invention includes receiving a target layer and an OPC mask layer, classifying cells as repeating or non-repeating, and recognizing geometric points to determine quality measuring groups. The method also simulates the OPC mask layer and measures edge placement errors (EPEs), providing a layer that represents EPEs exceeding a specified threshold.
Career Highlights
Throughout his career, Ilya Golubtsov has worked with notable companies such as LSI Logic Corporation and LSI Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and design methodologies.
Collaborations
Golubtsov has collaborated with talented individuals in the field, including Stanislav V. Aleshin and Sergei Rodin. These collaborations have further enriched his work and contributed to advancements in the industry.
Conclusion
Ilya Golubtsov is a distinguished inventor whose contributions to geometric point recognition and OPC mask quality analysis have made a significant impact in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology in integrated circuit design.
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