Location History:
- Cambridge, GB (2013 - 2014)
- Cambridgeshire, GB (2015)
Company Filing History:
Years Active: 2013-2015
Title: The Innovative Contributions of Ilie Poenaru
Introduction
Ilie Poenaru is a notable inventor based in Cambridge, GB. He has made significant contributions to the field of infrared (IR) technology, holding a total of 3 patents. His work focuses on developing advanced IR devices that have practical applications in various industries.
Latest Patents
Among his latest patents is a device titled "Plasmonic IR devices." This invention features a dielectric membrane formed on a silicon substrate, which includes an etched portion and at least one patterned layer. This layer is designed to control IR emission or absorption, incorporating laterally spaced structures. Another significant patent is the "IR emitter and NDIR sensor." This device is a micro-hotplate IR source that includes a CMOS metal layer embedded on a dielectric membrane supported by a silicon substrate. The device is created through a CMOS process followed by a back etching step. It can also be configured as an array of small membranes, which are closely packed for enhanced mechanical stability while maintaining the same total IR emission level. The use of Silicon-On-Insulator (SOI) technology allows for high ambient temperature operation and the integration of a temperature sensor beneath the IR source.
Career Highlights
Ilie Poenaru has worked with several companies, including Cambridge CMOS Sensors Limited and AMS Sensors UK Limited. His experience in these organizations has contributed to his expertise in the development of cutting-edge IR technologies.
Collaborations
Throughout his career, Ilie has collaborated with notable individuals such as Florin Udrea and Julian Gardner. These partnerships have further enriched his work and innovations in the field.
Conclusion
Ilie Poenaru's contributions to infrared technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative work continues to influence advancements in IR devices and applications.