Kyungki-Do, South Korea

Il Seok Seo

This inventor holds 1 USPTO granted patent. Top assignee: Hyundai Electronics Industries Co. Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Il Seok Seo. Retrieved from https://idiyas.com/inventor/il-seok-seo-pag02xhh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Il Seok Seo: Innovator in Semiconductor Technology

Introduction

Il Seok Seo is a prominent inventor based in Kyoungkido, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of polymer removal processes.

Latest Patents

Il Seok Seo holds a patent for a method of removing polymer from semiconductor devices. This innovative method includes several steps: forming a photoresist pattern on a to-be-etched layer, etching the layer using a mixed gas containing carbon/fluorine compounds and oxygen gas, and removing the photoresist pattern at temperatures below 200°C. Additionally, the process involves dry-etching a polymer generated during the etching of the to-be-etched layer, all conducted within a dry etching chamber. He has 1 patent to his name.

Career Highlights

Il Seok Seo is currently employed at Hyundai Electronics Industries Co. Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Hae Jung Lee and Sang Wook Kim, contributing to various projects within the semiconductor industry.

Conclusion

Il Seok Seo's innovative methods in semiconductor technology highlight his expertise and commitment to advancing the field. His contributions are essential for the ongoing development of efficient semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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