Company Filing History:
Years Active: 1999-2002
Title: **Iku Shiota: A Pioneer in Semiconductor Innovation**
Introduction
Iku Shiota, an accomplished inventor based in Isehara, Japan, holds a remarkable portfolio of four patents. His work has significantly advanced semiconductor processing methods, particularly in improving efficiency and effectiveness in the manufacturing of semiconductor substrates.
Latest Patents
One of Iku Shiota’s latest patents is a **processing method for an object to be processed including a pre-coating step to seal fluorine**. This method enhances the production process of wafers through an innovative setup involving an electrostatic chuck and precise temperature management during plasma formation. The process allows for the effective cleaning of the film-formation chamber and includes a protective aluminum nitride plate to safeguard the electrostatic chuck surface.
Another notable patent is related to a **semiconductor substrate and production method thereof**. This patent aims to create an SOI (Silicon On Insulator) substrate that is highly suitable for the production of high-frequency transistors. The innovative method includes bonding a first base with a semiconductor layer region to a second base and strategically removing the first base to retain the semiconductor layer.
Career Highlights
Iku Shiota has worked for prestigious companies such as Canon Kabushiki Kaisha and Tokyo Electron Limited. His career has been marked by significant contributions to the field of semiconductor technology, where he has honed his expertise in processing methods and material application.
Collaborations
Throughout his career, Iku has collaborated with notable figures in the industry, including Kyo Tsuboi and Shoichi Abe. These partnerships have fostered an environment of innovation and problem-solving that has propelled advancements in semiconductor devices.
Conclusion
Iku Shiota's contributions to semiconductor processing and substrate techniques make him a vital figure in the field of innovation. His patents not only demonstrate a deep understanding of material science but also reflect a commitment to improving manufacturing processes that benefit the industry as a whole. Through his work, Iku continues to inspire future generations of inventors and engineers in the ever-evolving landscape of technology.