Canon Kabushiki Kaisha

Tokyo Electron Limited

Iku Shiota

Kyo Tsuboi

Shoichi Abe

A wafer is mounted on a mounting stand that is provided with an electrostatic chuck. Then an SiOF film is formed by creating a plasma of a processing gas and heating the wafer W to approximately 350&deg; C. while the surface of the mounting stand is heated to 200&deg; C. After ten wafers W have been processed, cleaning is performed to remove a film S that has adhered to the interior of the film-formation chamber, and then a pre-coat is formed. A protective plate made of aluminum nitride is placed on the mounting stand during the cleaning and pre-coating steps. The protective plate protects the surface of the electrostatic chuck during the cleaning and prevents the formation of a film on the mounting stand during the pre-coating. In addition, since the protective plate is electrostatically attracted to the mounting stand and it is also strong with respect to thermal shocks, there is no need to lower the temperature of the mounting stand during the cleaning, which improves throughput.

Processing method for object to be processed including a pre-coating step to seal fluorine

In order to provide a semiconductor substrate that can be an SOI substrate suitable for production of high-frequency transistor, the semiconductor substrate is produced by a method of producing the semiconductor substrate having a step of bonding a first base having a semiconductor layer region to a second base and a step of removing the first base while leaving the semiconductor layer region on the second base, wherein a magnitude relation between the concentration of a p-type impurity and the concentration of an n-type impurity in the bonding atmosphere is established according to the composition of the second base.

Semiconductor substrate and production method thereof

After the release of the application of an attraction voltage to an electrostatic chuck that is attracting a semiconductor wafer, the wafer is pushed upward by lifting pins through only a very small projection distance. Immediately after processing has ended, the temperature of the wafer is several tens of degrees higher than that of the electrostatic chuck so that, if the wafer has detached, the temperature of the rear surface thereof will fall toward the original temperature of the electrostatic chuck. If the wafer has not detached, the temperature thereof will not fall. Therefore, a determination is made as to whether the wafer has detached or whether it is being subjected to residual attraction, based on temperature change data obtained for the wafer in combination with the electrostatic chuck, by a temperature sensor after the wafer has been pushed upward by a very small projection distance. If there is residual attraction, wafer transfer is halted. This makes it possible to prevent damage to the wafer that would occur if an unreasonable force is applied to the wafer by the residual attraction when the wafer is being detached from the electrostatic chuck.

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Isehara, Japan

Iku Shiota