Moscow, Russia

Igor Yefimovich Kardash

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Igor Yefimovich Kardash. Retrieved from https://idiyas.com/inventor/igor-yefimovich-kardash

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Igor Yefimovich Kardash: Innovator in Semiconductor Technology

Introduction

Igor Yefimovich Kardash is a prominent inventor based in Moscow, Russia. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work on organic polymer films.

Latest Patents

Kardash holds a patent for a "Polyparaxylylene film, production method therefor and semiconductor device." This invention features an organic polymer film characterized by a low dielectric constant and high heating resistance. It serves as an insulating layer for semiconductor devices, enhancing their performance and reliability. The patent also includes a manufacturing method for the film and a semiconductor device that incorporates this advanced material.

Career Highlights

Igor Kardash is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop cutting-edge solutions in the semiconductor industry. His expertise in materials science and engineering has positioned him as a valuable asset in his field.

Collaborations

Kardash has collaborated with notable colleagues, including Akio Takahashi and Yuichi Satsu. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Igor Yefimovich Kardash is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His innovative patent and contributions to Hitachi, Ltd. highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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