This inventor holds 2 USPTO granted patents. Top assignee: Other. Active years: 1977.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1977
Title: Igor Sergeevich Burov: Innovator in Plasma-Chemical Technology
Introduction
Igor Sergeevich Burov is a notable inventor based in Minsk, Belarus. He has made significant contributions to the field of plasma-chemical technology, holding 2 patents that showcase his innovative approach to material treatment and chemical production.
Latest Patents
Burov's latest patents include a plasma-chemical reactor designed for the treatment of disperse materials. This reactor features a vertical working chamber equipped with mechanisms for feeding disperse materials and plasma-heating process gas. The design incorporates multiple plasmatrons positioned around the chamber's bottom, facilitating efficient processing. Another significant patent details a process for producing hydrogen fluoride, phosphoric anhydride, calcium polyphosphates, and nitric acid. This process utilizes natural phosphate heated by a plasma stream in the presence of water vapor, allowing for the recovery of hydrogen fluoride and the subsequent production of various commercial products.
Career Highlights
Throughout his career, Igor Burov has focused on advancing plasma-chemical processes. His work emphasizes high efficiency and the ability to produce multiple valuable products from inexpensive raw materials. His innovative methods have the potential to revolutionize the chemical production industry.
Collaborations
Burov has collaborated with notable colleagues, including Vladimir Vladimirovich Bysjuk and Alfred Lvovich Mosse. These partnerships have contributed to the development and refinement of his patented technologies.
Conclusion
Igor Sergeevich Burov stands out as a pioneering inventor in the realm of plasma-chemical technology. His patents reflect a commitment to innovation and efficiency in chemical processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile