The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1977
Filed:
Jun. 07, 1974
Igor Sergeevich Burov, Minsk, SU;
Vladimir Vladimirovich Bysjuk, Minsk, SU;
Alfred Lvovich Mosse, Minsk, SU;
Leonid Stepanovich Shkurko, Minsk, SU;
Vyacheslav Andreevich Vashkevich, Minsk, SU;
Other;
Abstract
A plasma-chemical reactor for treatment of disperse materials comprises a vertical working chamber. The top portion of the working chamber includes means to feed the disperse material into the reactor. The working chamber is provided with means for feeding and plasma-heating process gas, said means being a number of plasmatrons the nozzles of which are arranged along the periphery of the working chamber bottom portion and directed essentially at a right angle to the working chamber vertical axis. The reactor also includes means for evacuating gaseous products from the working chamber and a bin located under the working chamber and communicating with the bottom portion thereof.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile