Eindhoven, Netherlands

Ignacio Salvador Vazquez Rodarte


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Ignacio Salvador Vazquez Rodarte: Innovator in Lithographic Processes

Introduction

Ignacio Salvador Vazquez Rodarte is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly in methods and apparatus for controlling lithographic processes. His innovative approach has led to the development of a patent that enhances the efficiency and accuracy of lithographic techniques.

Latest Patents

Ignacio holds a patent titled "Methods and apparatus for controlling a lithographic process." This patent describes a method for determining a control parameter for a lithographic process. The method involves defining a substrate model that represents a process parameter fingerprint across a substrate. It includes receiving measurements of the process parameter across at least one substrate and calculating substrate model parameters using these measurements. The control parameter is then determined based on the substrate model parameters and the similarity of the basis functions to variations in the process parameter fingerprint.

Career Highlights

Ignacio is currently employed at ASML Netherlands B.V., a leading company in the development of advanced lithography systems. His work at ASML has positioned him as a key player in the innovation of lithographic technologies. With a focus on improving process control, Ignacio's contributions are vital to the advancement of semiconductor manufacturing.

Collaborations

Ignacio collaborates with talented professionals in his field, including Roy Werkman and David Frans Simon Deckers. These collaborations enhance the innovative environment at ASML and contribute to the development of cutting-edge lithographic solutions.

Conclusion

Ignacio Salvador Vazquez Rodarte is a distinguished inventor whose work in lithographic processes has made a significant impact on the industry. His patent and contributions at ASML reflect his commitment to innovation and excellence in technology.

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