Asml Netherlands B.v.

Ignacio Salvador Vazquez Rodarte

Roy Werkman

Sarathi Roy

David Frans Simon Deckers

Bijoy Rajasekharan

A method of determining a control parameter for a lithographic process is disclosed, the method includes: defining a substrate model for representing a process parameter fingerprint across a substrate, the substrate model being defined as a combination of basis functions including at least one basis function suitable for representing variation of the process parameter fingerprint between substrates and/or batches of substrates; receiving measurements of the process parameter across at least one substrate; calculating substrate model parameters using the measurements and the basis functions; and determining the control parameter based on the substrate model parameters and the similarity of the at least one basis function to a process parameter fingerprint variation between substrates and/or batches of substrates.

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Eindhoven, Netherlands

Ignacio Salvador Vazquez Rodarte