This inventor holds 2 USPTO granted patents. Top assignee: Macdermid, Incorporated. Active years: 1989-1990.
Company Filing History:
Years Active: 1989-1990
Title: Igal Klein: Innovator in Mechanical Plating Technology
Introduction
Igal Klein is a notable inventor based in Karmiel, Israel. He has made significant contributions to the field of mechanical plating, particularly with oxidation-prone metals. With a total of 2 patents to his name, Klein's work addresses critical challenges in metal substrate applications.
Latest Patents
One of Igal Klein's latest patents focuses on a mechanical plating process that allows for the application of oxidation-prone metals, such as aluminum, titanium, and magnesium, to metal substrates. This innovative process overcomes corrosion issues commonly encountered in prior art. By plating the substrate with oxidation-prone metals and incorporating minor amounts of an immersion metal, Klein's method prevents the formation of an oxide layer. The immersion metal can include salts or oxides of metals like tin, copper, and nickel. Additionally, a protective metal is used to safeguard the plated substrate from environmental oxidation. An etching agent is also utilized during the mechanical plating process to enhance effectiveness.
Career Highlights
Igal Klein is associated with Macdermid, Incorporated, where he continues to develop and refine his innovative techniques in mechanical plating. His expertise in this area has positioned him as a valuable asset to the company and the industry.
Collaborations
Klein has collaborated with notable colleagues, including John J. Grunwald and Bryan Whitmore. Their combined efforts contribute to advancing the field of mechanical plating and enhancing the effectiveness of metal applications.
Conclusion
Igal Klein's contributions to mechanical plating technology demonstrate his commitment to innovation and problem-solving in the field. His patents reflect a deep understanding of materials and processes that enhance the durability and performance of metal substrates.
