Haifa, Israel

Ido Friedler

USPTO Granted Patents = 1 

Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Ido Friedler: Innovator in Advanced Manufacturing Technologies

Introduction

Ido Friedler is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of advanced manufacturing technologies, particularly in the area of three-dimensional NAND memory units. His innovative work has led to the development of a unique evaluation system that enhances manufacturing processes.

Latest Patents

Ido Friedler holds a patent for an invention titled "Evaluating a hole formed in an intermediate product." This evaluation system includes an imager and a processing circuit. The imager is designed to capture an electron image of a hole created by an etch process, which exposes at least one layer of a set of layers that differ by their electron yield. The processing circuit evaluates whether the hole has reached the target layer of the intermediate product, which is crucial in the manufacturing stages of three-dimensional NAND memory units. The hole exhibits a high aspect ratio and has a width on a nanometric scale. This patent showcases Ido's expertise in enhancing the precision of manufacturing processes.

Career Highlights

Ido Friedler is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of innovation in manufacturing technologies. His work is instrumental in improving the efficiency and effectiveness of production processes in the semiconductor industry.

Collaborations

Ido has collaborated with talented professionals in his field, including Roman Kris and Grigory Klebanov. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Ido Friedler's contributions to the field of advanced manufacturing technologies are noteworthy. His innovative patent and collaborative efforts reflect his commitment to enhancing the efficiency of semiconductor manufacturing processes. His work continues to influence the industry positively.

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