This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kla Corporation. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Ido Dolev: Innovator in Semiconductor Technology
Introduction
Ido Dolev is a notable inventor based in Manof, Israel, recognized for his contributions to semiconductor technology. He holds a patent that showcases his innovative approach to enhancing product design and functionality.
Latest Patents
Ido Dolev's most recent patent focuses on on-product overlay targets. This invention involves a product that includes a semiconductor substrate with at least first and second thin-film layers. These layers are patterned to define a matrix of dies, which are separated by scribe lines and contain active areas circumscribed by the scribe lines. A plurality of overlay targets are formed in the first and second thin-film layers within each of the active areas. Each overlay target has dimensions no greater than 10 μm×10 μm in a plane parallel to the substrate. The plurality of overlay targets includes a first linear grating formed in the first thin-film layer and a second linear grating formed in the second thin-film layer, which is in proximity to the first linear grating.
Career Highlights
Ido Dolev is currently associated with Kla Corporation, a company known for its advanced semiconductor process control solutions. His work at Kla Corporation has significantly contributed to the field of semiconductor manufacturing.
Collaborations
Ido Dolev has collaborated with notable colleagues, including Amnon Manassen and Vladimir Levinski. These collaborations have fostered innovation and development in their respective projects.
Conclusion
Ido Dolev's contributions to semiconductor technology through his patent on overlay targets exemplify his innovative spirit and dedication to advancing the industry. His work continues to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
