Redwood City, CA, United States of America

Ian Flader


Average Co-Inventor Count = 1.5

ph-index = 1


Company Filing History:


Years Active: 2021-2023

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6 patents (USPTO):

Title: Ian Flader: Innovator in MEMS Technology

Introduction

Ian Flader is a notable inventor based in Redwood City, California. He has made significant contributions to the field of micro-electromechanical systems (MEMS) technology. With a total of six patents to his name, Flader's work focuses on innovative methods to enhance the performance and reliability of MEMS devices.

Latest Patents

Flader's latest patents include a stiction reduction system and method. This invention discloses methods and systems for reducing stiction through roughening the surface and minimizing the contact area in MEMS devices. One method involves fabricating bumpstops on a MEMS device substrate to mitigate stiction. Another method applies a roughening etchant to a silicon substrate surface to enhance roughness after cavity etch and before the removal of the hardmask. Additionally, he describes a method to reduce the contact area between the proof mass and the upper cavity substrate surface while maintaining high pressure in the accelerometer cavity. Another innovative approach includes increasing the surface roughness of a substrate by depositing a rough layer, such as polysilicon, and etching it back to transfer the roughness.

Career Highlights

Ian Flader is currently employed at InvenSense, Inc., where he continues to develop cutting-edge MEMS technologies. His work has significantly impacted the design and functionality of MEMS devices, making them more efficient and reliable.

Collaborations

Flader has collaborated with talented individuals in his field, including Dongyang Kang and Daesung Lee. Their combined expertise has contributed to the advancement of MEMS technology.

Conclusion

Ian Flader is a prominent inventor whose work in MEMS technology has led to innovative solutions for reducing stiction and enhancing device performance. His contributions continue to shape the future of this critical field.

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