Company Filing History:
Years Active: 2013-2018
Title: Innovations of I-Chiao Lin in Graphene Technology
Introduction
I-Chiao Lin is a prominent inventor based in Taipei, Taiwan, known for his significant contributions to the field of graphene technology. With a total of three patents to his name, Lin has been at the forefront of developing innovative methods and materials that leverage the unique properties of graphene.
Latest Patents
One of Lin's latest patents is a method for fabricating graphene platelets. This invention outlines a process that involves providing highly-graphitized graphene with a graphitization degree of 0.8-1.0 and applying shear force to separate it into graphene platelets. These platelets possess dimensions ranging from 10 to 500 micrometers and can be either single-layer or multi-layer structures. Another notable patent is for a heat conducting composite material that incorporates a graphene sheet. This material is designed to convert radiation energy into infrared light, enhancing radiating efficiency. Additionally, Lin has developed a light-emitting diode (LED) that utilizes this composite material to achieve effective heat dissipation.
Career Highlights
I-Chiao Lin is currently associated with Ritedia Corporation, where he continues to innovate and develop advanced materials. His work has positioned him as a key figure in the research and application of graphene technologies.
Collaborations
Lin collaborates with notable colleagues, including Hung-Cheng Lin and Shao-Chung Hu, contributing to a dynamic research environment that fosters innovation.
Conclusion
I-Chiao Lin's work in graphene technology exemplifies the potential of innovative materials in modern applications. His patents reflect a commitment to advancing the field and improving the efficiency of various technologies.