I-Chen Chen

Title: I-Chen Chen: Innovator in Semiconductor Manufacturing

Introduction

I-Chen Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

I-Chen Chen's latest patents include a method of manufacturing semiconductor devices. In this method, sacrificial patterns are formed over a hard mask layer disposed over a substrate. Sidewall patterns are then created on the sidewalls of the sacrificial patterns. After the sacrificial patterns are removed, the sidewall patterns remain as first hard mask patterns. The hard mask layer is subsequently patterned using these first hard mask patterns as an etching mask, resulting in the formation of second hard mask patterns. Finally, the substrate is patterned using the second hard mask patterns as an etching mask, which leads to the creation of fin structures. Notably, each of the first sacrificial patterns has a tapered shape, with a top smaller than the bottom.

Career Highlights

I-Chen Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a valuable asset to the company.

Collaborations

I-Chen Chen has collaborated with notable coworkers, including Kun-Yu Lin and Yu-Ling Ko, who contribute to the dynamic environment of innovation at their workplace.

Conclusion

I-Chen Chen's contributions to semiconductor manufacturing exemplify the spirit of innovation in technology. His patents reflect a commitment to advancing the field and improving device manufacturing processes.