Taoyuan, Taiwan

I-Chang Lee

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: I-Chang Lee. Retrieved from https://idiyas.com/inventor/i-chang-lee-2h2dpuv6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: I-Chang Lee: Innovator in Interconnect Structures

Introduction

I-Chang Lee is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of interconnect structures. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.

Latest Patents

I-Chang Lee holds a patent for an "Interconnect structure and methods of forming the same." This patent describes an interconnect structure along with methods for its formation. The method includes forming a first dielectric layer over one or more devices, creating a first conductive feature in the first dielectric layer, and establishing two dielectric features over the first dielectric layer and the first conductive feature. Notably, at least one of the dielectric features has a first width, and each feature comprises a first low-k dielectric layer, an oxide layer, and a first etch stop layer. Additionally, the method involves forming a second conductive feature between the two dielectric features, with the second conductive feature having a width substantially the same as the first width. This innovative approach enhances the performance and efficiency of semiconductor devices.

Career Highlights

I-Chang Lee is associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading player in the semiconductor industry. His work at this esteemed company has allowed him to contribute to cutting-edge technologies and advancements in semiconductor manufacturing.

Collaborations

I-Chang Lee has collaborated with talented individuals such as Chih-Yuan Ting and Yu-An Chen. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

I-Chang Lee's contributions to the field of interconnect structures exemplify his dedication to innovation in semiconductor technology. His patent and collaborations highlight his role as a significant inventor in this industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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