Xi'an, China

Hyunguk Jeon

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Xi'an Eswin Material Technology Co., Ltd., Xi'an Eswin Silicon Wafer Technology Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyunguk Jeon. Retrieved from https://idiyas.com/inventor/hyunguk-jeon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hyunguk Jeon: Innovator in Monocrystalline Silicon Technology

Introduction

Hyunguk Jeon is a notable inventor based in Xi'an, China. He has made significant contributions to the field of material technology, particularly in the area of monocrystalline silicon. His innovative approaches have led to advancements that are crucial for various applications in the semiconductor industry.

Latest Patents

Hyunguk Jeon holds a patent for a "Method for regulating inert gas flow, method for preparing monocrystalline silicon, and monocrystalline silicon." This patent outlines a method for regulating inert gas flow in a crystal pulling furnace. It includes the introduction of inert gas into the main furnace chamber from an auxiliary chamber and the regulation of the flow direction of the gas. This innovation is essential for improving the quality and efficiency of monocrystalline silicon production.

Career Highlights

Throughout his career, Hyunguk Jeon has worked with prominent companies in the technology sector. He has been associated with Xi'an Eswin Material Technology Co., Ltd. and Xi'an Eswin Silicon Wafer Technology Co., Ltd. His work in these organizations has allowed him to apply his innovative ideas and contribute to the development of advanced materials.

Collaborations

Hyunguk Jeon has collaborated with various professionals in his field, including his coworker Hao Pan. These collaborations have fostered an environment of innovation and have led to

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…