Hyungjin Ma

Title: Hyungjin Ma: Innovator in Optical Proximity Correction

Introduction

Hyungjin Ma is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of optical proximity correction (OPC) in integrated circuit design. His innovative work has led to the development of a unique method that enhances the accuracy of lithography processes.

Latest Patents

Hyungjin Ma holds a patent for a "Multilayer optical proximity correction (OPC) model for OPC correction." This method involves creating a semi-physical model of a mask for a current layer in an integrated circuit design layout. The model utilizes physical parameters of the lithography process to specify the contours of various features of the mask. The process determines if the current layer is deformed by overlapping reference layers. If deformation is detected, the semi-physical model and design information are input into a trained machine learning algorithm. This generates a contour shift prediction for the current layer, which is then used for multilayer OPC correction.

Career Highlights

Hyungjin Ma is currently employed at Intel Corporation, where he applies his expertise in optical proximity correction. His work is crucial in improving the precision of semiconductor manufacturing processes. With a focus on innovation, he continues to contribute to advancements in the field.

Collaborations

Hyungjin has collaborated with notable colleagues, including Gregory Toepperwein and Nabil Laachi. Their combined efforts in research and development have furthered the understanding and application of optical proximity correction techniques.

Conclusion

Hyungjin Ma's contributions to optical proximity correction demonstrate his commitment to innovation in semiconductor technology. His patent and collaborative efforts highlight the importance of precision in integrated circuit design.