Incheon, South Korea

Hyun Seung Shin

This inventor holds 1 USPTO granted patent. Top assignee: Park Systems Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyun Seung Shin. Retrieved from https://idiyas.com/inventor/hyun-seung-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Hyun Seung Shin: Innovator in Scanning Probe Microscopy

Introduction

Hyun Seung Shin is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of microscopy, particularly through his innovative designs and methods.

Latest Patents

Hyun Seung Shin holds a patent for a "Scanning probe microscope for measuring angle and method of measuring a sample using the same." This invention provides a scanning probe microscope (SPM) that prevents image distortion caused by alignment errors of scanners. The SPM comprises a probe, a first scanner that changes the position of the probe along a straight line, a second scanner that changes the position of a sample in a plane, and an adjusting device that ensures the straight line of the probe's movement is perpendicular to the sample's plane.

Career Highlights

Hyun Seung Shin is associated with Park Systems Corporation, a company known for its advancements in scanning probe microscopy technology. His work has contributed to the development of more accurate and reliable measurement techniques in scientific research.

Collaborations

He collaborates with talented coworkers, including Young Doo Kim and Yong Kim, who share his passion for innovation in microscopy.

Conclusion

Hyun Seung Shin's contributions to scanning probe microscopy exemplify the impact of innovative thinking in scientific instrumentation. His patent reflects a commitment to enhancing measurement accuracy, which is crucial for various research applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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