Company Filing History:
Years Active: 2018
Title: Innovator Spotlight: Hyun-Seok Uhm
Introduction: Hyun-Seok Uhm, an accomplished inventor based in Hwaseong-si, South Korea, has made significant contributions to the field of photomask technology. His innovative approach has led to the development of a patented method that enhances pattern generation, showcasing his expertise in the realm of engineering and technology.
Latest Patents: Hyun-Seok Uhm holds a patent titled "Method of generating a pattern on a photomask using a plurality of beams and pattern generator for performing the same." This groundbreaking invention involves generating a first bit map from inputted pattern data. By analyzing the characteristics of multiple beams designated for exposure, the method corrects pattern data to ensure optimal performance, ultimately producing a second bit map that guides the substrate patterning process using the designated beams.
Career Highlights: Currently, Hyun-Seok Uhm is associated with Samsung Electronics Co., Ltd., a leading technology company renowned for its advancements in electronics and innovation. His role at Samsung highlights his commitment to pushing the boundaries of technology and contributing to cutting-edge solutions in photolithography.
Collaborations: Throughout his career, Hyun-Seok Uhm has collaborated with notable colleagues, including Sang-Hee Lee and Il-Yong Jang. These partnerships have further enriched his contributions to the field, fostering an environment of shared knowledge and innovation within the team.
Conclusion: Hyun-Seok Uhm's inventive spirit and dedication to enhancing photomask technology epitomize the essence of innovation. His patent serves as a testament to his ability to navigate complex engineering challenges and deliver effective solutions that meet the demands of modern technology. As he continues to work with esteemed colleagues at Samsung Electronics, the future looks promising for further advancements in his area of expertise.