Busan, South Korea

Hyun Hee Hwang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lumigntech Co., Ltd.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyun Hee Hwang. Retrieved from https://idiyas.com/inventor/hyun-hee-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2014

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hyun Hee Hwang: Innovator in Substrate Manufacturing

Introduction

Hyun Hee Hwang is a notable inventor based in Busan, South Korea. She has made significant contributions to the field of substrate manufacturing, showcasing her expertise through her innovative patent.

Latest Patents

Hyun Hee Hwang holds a patent for a "Method of manufacturing substrate." This invention involves a detailed process that includes loading a base substrate into a reaction furnace, forming a buffer layer on the base substrate, and subsequently forming a separation layer on the buffer layer. Additionally, she creates a semiconductor layer on the separation layer and separates the semiconductor layer from the base substrate via the separation layer through natural cooling by unloading the base substrate from the reaction furnace. This innovative method enhances the efficiency and effectiveness of substrate manufacturing.

Career Highlights

Hyun Hee Hwang is currently employed at Lumigntech Co., Ltd., where she continues to develop her expertise in substrate technology. Her work has positioned her as a key player in the industry, contributing to advancements in semiconductor manufacturing.

Collaborations

Some of her notable coworkers include Young Jun Choi and Jin Hun Kim, who collaborate with her on various projects within the company.

Conclusion

Hyun Hee Hwang's contributions to substrate manufacturing through her innovative patent reflect her dedication to advancing technology in her field. Her work at Lumigntech Co., Ltd. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…