Seoul, South Korea

Hyuk-Woo Kwon


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2021-2023

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2 patents (USPTO):Explore Patents

Title: Hyuk-Woo Kwon: Innovator in Semiconductor Technology

Introduction

Hyuk-Woo Kwon is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced memory devices. His innovative work has led to the filing of multiple patents, showcasing his expertise and commitment to technological advancement.

Latest Patents

Hyuk-Woo Kwon holds 2 patents that focus on cutting-edge semiconductor devices. His latest patents include a DRAM with a hydrogen-supply layer and a high-capacitance embedded capacitor with a cylindrical storage node. This invention outlines a semiconductor device and a method of manufacturing it, which includes a substrate, a lower structure with pad patterns, lower electrodes, a dielectric layer, and an upper electrode. The hydrogen supply layer, which contains hydrogen, is strategically positioned between the lower electrodes and closer to the substrate than the dielectric layer.

Career Highlights

Hyuk-Woo Kwon is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His role at Samsung has allowed him to work on groundbreaking projects that push the boundaries of semiconductor technology. His contributions have been instrumental in enhancing the performance and efficiency of memory devices.

Collaborations

Throughout his career, Hyuk-Woo Kwon has collaborated with notable colleagues, including Jun-Won Lee and Ik-Soo Kim. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hyuk-Woo Kwon is a distinguished inventor whose work in semiconductor technology continues to impact the industry significantly. His patents reflect his dedication to advancing memory device technology, and his collaborations with talented colleagues further enhance his contributions to the field.

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