Hyosin Kim

Title: Innovations of Hyosin Kim

Introduction

Hyosin Kim is a notable inventor based in Suncheon-si, South Korea. He has made significant contributions to the field of radio frequency (RF) technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Hyosin Kim's latest patents include a "Hybrid matcher and radio frequency matching system including the hybrid matcher." This invention provides a hybrid matcher capable of precisely performing impedance matching at high speed when RF power is applied with a multi-level pulse in facilities using RF plasma. The hybrid matcher consists of a matching circuit with multiple variable element-switch sets connected in parallel. Each set includes a variable impedance element and a switch that operates in conjunction with it. Additionally, a sensor measures the current and voltage of RF power from an RF generator, while a variable element driver and switch driver control the respective components.

Another significant patent is the "Plasma control apparatus and plasma processing system including the same." This apparatus is designed to control plasma distribution uniformly within a plasma chamber. It features a transmission line that delivers RF power through at least two frequencies, a matching circuit for optimal impedance control, and a plasma control circuit that manages harmonics at very high frequencies to ensure effective plasma distribution.

Career Highlights

Hyosin Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in RF technology. His work has been instrumental in advancing the capabilities of plasma processing systems, which are crucial in various industrial applications.

Collaborations

He has collaborated with talented coworkers, including Seungbo Shim and Donghyeon Na, who contribute to the innovative projects at Samsung Electronics.

Conclusion

Hyosin Kim's contributions to RF technology through his patents reflect his dedication to innovation and excellence. His work not only enhances the efficiency of plasma processing systems but also sets a benchmark for future advancements in the field.