Suwon-si, South Korea

Hyosan Lee

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyosan Lee. Retrieved from https://idiyas.com/inventor/hyosan-lee-a816ka92

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Hyosan Lee: Innovator in Semiconductor Technology

Introduction

Hyosan Lee is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on etching compositions and methods that are crucial for the manufacturing of semiconductor devices.

Latest Patents

Hyosan Lee's latest patents include an etching composition that comprises an oxidizing agent, an ammonium salt, an aqueous solvent, and an accelerator. This innovative etching composition is designed for etching metal-containing films. Additionally, he has developed a method for preparing semiconductor devices using this etching composition. These advancements are vital for enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Hyosan Lee is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His role involves research and development in semiconductor technologies, where he applies his expertise to create innovative solutions that meet industry demands.

Collaborations

Hyosan Lee has collaborated with notable colleagues, including Daihyun Kim and Hwang Suk Kim. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hyosan Lee's contributions to semiconductor technology through his patents and work at Samsung Electronics Ltd. highlight his role as a key innovator in the field. His advancements in etching compositions and methods are paving the way for future developments in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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