Hyohoon Byeon

Title: Hyohoon Byeon: Innovator in Semiconductor Technology

Introduction

Hyohoon Byeon is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor devices, showcasing his expertise and innovative spirit. With a focus on advancing technology, Byeon has secured a patent that highlights his work in this critical area.

Latest Patents

Hyohoon Byeon holds a patent for a semiconductor device that includes a substrate with an active region extending in a first direction. The device features a gate structure that intersects the active region and extends in a second direction. Additionally, it comprises a plurality of channel layers that are spaced apart in a third direction, which is perpendicular to the substrate's upper surface. The design also includes source and drain regions located in recess areas of the active region, positioned on opposite sides of the gate structure and electrically connected to the channel layers. Each channel layer consists of first to third semiconductor layers, with the first and third layers made of silicon and the second layer composed of silicon-germanium.

Career Highlights

Hyohoon Byeon is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to semiconductor technology.

Collaborations

Some of Hyohoon Byeon's notable coworkers include Dohyun Go and Sungkeun Lim. Their collaborative efforts have played a vital role in advancing the projects they work on together.

Conclusion

Hyohoon Byeon is a dedicated inventor whose work in semiconductor devices reflects his commitment to innovation and technology. His patent and contributions to Samsung Electronics Ltd. underscore his importance in the field.