Ann Arbor, MI, United States of America

Hyochan An

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hyochan An: Innovator in Integrated Circuit Anomaly Detection

Introduction

Hyochan An is a notable inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of integrated circuits, particularly in the area of anomaly detection using advanced machine learning models. His innovative approach has the potential to enhance the reliability and performance of integrated circuits in various applications.

Latest Patents

Hyochan An holds a patent for "In-situ detection of anomalies in integrated circuits using machine learning models." This patent describes an integrated circuit (IC) designed for in-situ anomaly detection. The IC incorporates sensors that generate datasets containing information about the conditions within the circuit. A processing unit within the IC utilizes these datasets and a machine learning model to detect and classify anomalies. The model can continuously train in-situ, allowing for real-time anomaly detection and classification, which can significantly improve the operational efficiency of integrated circuits.

Career Highlights

Hyochan An is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing and integrated circuit design. His work at Intel focuses on developing cutting-edge technologies that enhance the functionality and reliability of electronic devices.

Collaborations

Hyochan An collaborates with Vivek K De, a fellow innovator in the field. Their partnership aims to push the boundaries of integrated circuit technology and improve the methodologies used for anomaly detection.

Conclusion

Hyochan An's contributions to integrated circuit technology through his innovative patent demonstrate his commitment to advancing the field. His work at Intel Corporation and collaborations with other experts highlight the importance of teamwork in driving technological progress.

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