This inventor holds 3 USPTO granted patents. Top assignee: Auros Technology, Inc.. Active years: 2024-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2025
Title: Hyo-Sik Ham: Innovator in Overlay Measurement Technology
Introduction
Hyo-Sik Ham is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of overlay measurement technology, holding three patents to his name. His work focuses on enhancing the precision and efficiency of measurement devices used in various applications.
Latest Patents
One of Hyo-Sik Ham's latest patents is an overlay measurement device and method for controlling focus movement, along with a program storage medium for the same. This innovative device includes a lighting part designed to direct light toward an overlay measurement target. It features a collection part that comprises an objective lens and a detector, which captures images of each focus in the overlay measurement target. The device also includes a lens focus actuator that adjusts the distance between the objective lens and a wafer. A processor is responsible for controlling the operation of the lens focus actuator. It obtains focus graphs related to two layers from the captured images and identifies a reference focus to move the objective lens accordingly.
Career Highlights
Hyo-Sik Ham is currently employed at Auros Technology, Inc., where he continues to develop cutting-edge technologies in overlay measurement. His expertise and innovative approach have positioned him as a key figure in his field.
Collaborations
Hyo-Sik Ham collaborates with talented coworkers, including Seong-Yun Choi and Soo-Yeon Mo. Their combined efforts contribute to the advancement of technology at Auros Technology, Inc.
Conclusion
Hyo-Sik Ham's contributions to overlay measurement technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in measurement devices, paving the way for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile