Company Filing History:
Years Active: 2025
Title: Hyeon Sik Cho: Innovator in Thin Film Technology
Introduction
Hyeon Sik Cho is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of thin film technology, holding two patents that showcase his innovative approaches.
Latest Patents
Hyeon Sik Cho's latest patents include a method for areal selective forming of thin film. This method involves several steps, including substrate preparation, precursor supply, purging the chamber, and thin film formation. The process utilizes a Group 5 metal precursor compound to achieve precise thin film formation. Another notable patent is the area-selective method for forming thin film by using nuclear growth retardation. This method incorporates a nuclear growth retardant to selectively adsorb to non-growth regions of the substrate, allowing for controlled thin film development.
Career Highlights
Hyeon Sik Cho has established himself as a key figure in his field through his innovative work at Egtm Co., Ltd. His expertise in thin film technology has positioned him as a valuable asset to the company.
Collaborations
Hyeon Sik Cho collaborates with talented coworkers, including Ha Na Kim and Woong Jin Choi, contributing to a dynamic and innovative work environment.
Conclusion
Hyeon Sik Cho's contributions to thin film technology through his patents and work at Egtm Co., Ltd. highlight his role as a leading inventor in this specialized field. His innovative methods continue to advance the technology and inspire future developments.