Company Filing History:
Years Active: 2024
Title: Hyeon Beom Gwon: Innovator in Substrate Processing Technologies
Introduction
Hyeon Beom Gwon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing, particularly in improving the physical properties of thin films. With a total of 2 patents to his name, Gwon's work is pivotal in advancing semiconductor manufacturing technologies.
Latest Patents
Gwon's latest patents focus on innovative methods for substrate processing. The first patent describes a substrate processing method aimed at enhancing the physical properties of thin films formed on substrates. This method involves a series of steps, including pressurizing and depressurizing the substrate in a controlled environment to achieve optimal results. The second patent elaborates on a substrate processing apparatus and a semiconductor manufacturing method that regulates the flow rate of process gas during depressurizing operations. These inventions are crucial for improving the efficiency and quality of semiconductor devices.
Career Highlights
Hyeon Beom Gwon is currently associated with Wonik Ips Co., Ltd., where he continues to develop cutting-edge technologies in substrate processing. His expertise in this area has positioned him as a key player in the semiconductor industry.
Collaborations
Gwon collaborates with various professionals in his field, including his coworker Dae Seong Lee. Their combined efforts contribute to the advancement of substrate processing technologies.
Conclusion
Hyeon Beom Gwon's innovative work in substrate processing is instrumental in enhancing semiconductor manufacturing. His patents reflect a commitment to improving technology and efficiency in the industry.