Hwaseong, South Korea

Hwayoung Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hwayoung Park. Retrieved from https://idiyas.com/inventor/hwayoung-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Hwayoung Park: Innovator in Semiconductor Technology

Introduction

Hwayoung Park is a prominent inventor based in Hwaseong, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in manufacturing systems and inspection devices.

Latest Patents

Hwayoung Park holds 1 patent for a semiconductor device manufacturing system, which includes a spin coater and a coating layer inspector. The spin coater is designed with a chuck, a rotation driver to rotate the chuck, and a solution dispenser that sprays a solution onto the coating layer formed on the edge portion of the wafer. The coating layer inspector features an edge inspection camera and an inspection controller that determines the radius, eccentricity, and top-view shape of the coating layer based on images of the wafer's edge portion.

Career Highlights

Hwayoung Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor manufacturing processes. His work has been instrumental in enhancing the efficiency and accuracy of semiconductor device production.

Collaborations

Some of Hwayoung Park's coworkers include Yusang Cheon and Younghwan Kim, who collaborate with him on various projects within the semiconductor field.

Conclusion

Hwayoung Park's contributions to semiconductor technology exemplify the innovative spirit of modern inventors. His work not only advances the industry but also sets a foundation for future developments in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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