Company Filing History:
Years Active: 2001-2008
Title: Hway-Chi Lin: Innovator in Semiconductor Technology
Introduction
Hway-Chi Lin is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the reliability and efficiency of integrated circuits.
Latest Patents
One of Hway-Chi Lin's latest patents is a method for determining electro-migration failure mode. This method involves testing integrated circuits by forming identical test structures and stress testing them to identify early failures. Another notable patent is the rule to determine CMP polish time. This method calculates the optimum amount of material that needs to be removed during Chemical Mechanical Polishing (CMP) to achieve full planarization without introducing dishing.
Career Highlights
Hway-Chi Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches have contributed to advancements in circuit design and manufacturing processes.
Collaborations
Throughout his career, Hway-Chi Lin has collaborated with notable colleagues, including Ying-Lang Wang and Yu-Ku Lin. These partnerships have fostered a collaborative environment that enhances innovation in semiconductor technology.
Conclusion
Hway-Chi Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of reliable and efficient integrated circuits.