Miyagi, Japan

Hwajun Jung

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hwajun Jung. Retrieved from https://idiyas.com/inventor/hwajun-jung-iuqpd2os

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Hwajun Jung in Plasma Processing Technology

Introduction

Hwajun Jung is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus, which showcases his expertise and creativity in engineering.

Latest Patents

Hwajun Jung holds a patent for a plasma processing apparatus. This apparatus includes a plasma processing chamber and a substrate support that features an electrostatic chuck. The design incorporates a first ring surrounding the substrate, which consists of an inner annular portion, an intermediate annular portion, and an outer annular portion. The top surfaces of these portions are strategically designed to optimize the processing environment. Additionally, a second ring is positioned on the intermediate annular portion, and an actuator is included to adjust the height of the second ring, ensuring precise control during operation.

Career Highlights

Hwajun Jung is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to push the boundaries of plasma processing technology. His innovative designs and patents have contributed to advancements in the field, enhancing the efficiency and effectiveness of plasma processing systems.

Collaborations

Hwajun Jung has collaborated with talented individuals such as Masahiro Suzuki and Yuki Hosaka. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas. Working alongside such skilled professionals has undoubtedly enriched his contributions to the field.

Conclusion

Hwajun Jung's work in plasma processing technology exemplifies the spirit of innovation and creativity. His patent for a plasma processing apparatus highlights his ability to solve complex engineering challenges. Through his career at Tokyo Electron Limited and collaborations with esteemed colleagues, he continues to make a significant impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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