Santee, CA, United States of America

Huy Ly

This inventor holds 1 USPTO granted patent. Top assignee: Integrated-X, Inc.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Huy Ly. Retrieved from https://idiyas.com/inventor/huy-ly

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Huy Ly - Innovator in Electromagnetic Inspection Systems

Introduction

Huy Ly is a notable inventor based in Santee, California. He has made significant contributions to the field of inspection technology, particularly through his innovative patent. His work focuses on systems and methods for inspecting components using electromagnetic radiation.

Latest Patents

Huy Ly holds a patent for "Systems and methods for inspection using electromagnetic radiation." This patent describes a sophisticated system that includes a detector positioning system capable of moving the detector within five degrees of freedom. Additionally, it features an emitter positioning system that allows for movement in three dimensions. The device is designed to position the detector at a reference point above the component, ensuring precise inspections.

Career Highlights

Huy Ly is currently associated with Integrated-X, Inc., where he applies his expertise in developing advanced inspection technologies. His innovative approach has led to the creation of a device that enhances the accuracy and efficiency of component inspections.

Collaborations

Huy has collaborated with talented individuals such as Henry H Fung and Bruk Sahilu, contributing to the advancement of inspection systems and technologies.

Conclusion

Huy Ly's contributions to the field of electromagnetic inspection systems demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in inspection technology, showcasing his role as a leading inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…