Company Filing History:
Years Active: 2006
Title: Huxley Lee: Innovator in Semiconductor Manufacturing
Introduction
Huxley Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.
Latest Patents
Huxley Lee holds a patent titled "Method and composition to improve a nitride/oxide wet etching selectivity." This patent describes a method for wet etching a metal nitride containing layer overlying a silicon oxide containing layer in semiconductor device or micro-electro-mechanical device manufacturing processes. The process involves providing a substrate with a silicon oxide containing layer and an overlying exposed metal nitride containing layer. It includes using a wet etching solution composed of phosphoric acid and water, adding a silicon containing compound that undergoes hydrolysis in the solution, and contacting the exposed metal nitride layer with the solution to effectively remove it.
Career Highlights
Huxley Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance his research and development efforts in semiconductor technologies. His work has been instrumental in improving manufacturing processes and enhancing the efficiency of semiconductor devices.
Collaborations
Huxley collaborates with talented professionals in his field, including Ping Chuang and Henry Lo. Their combined expertise contributes to the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.
Conclusion
Huxley Lee's contributions to semiconductor manufacturing through his patent and collaborative efforts highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in technology.