New Albany, OH, United States of America

Husnu Alp Alidedeoglu


Average Co-Inventor Count = 7.1

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):

Title: Innovations of Husnu Alp Alidedeoglu

Introduction

Husnu Alp Alidedeoglu is an accomplished inventor based in New Albany, OH (US). He holds a total of 3 patents that showcase his expertise in the field of polymer films and electronic devices. His innovative work has contributed significantly to advancements in materials science.

Latest Patents

Alidedeoglu's latest patents include developments in metal-clad polymer films and electronic devices. One notable aspect of his work involves a metal-clad polymer film that features a polymer film adhered to a first metal layer. The interface between the polymer film and the first metal layer exhibits a root-mean-square roughness of less than 1 μm. Additionally, the peel strength between these layers exceeds 5 N/cm after 168 hours of aging at 150° C. His electronic device incorporates this advanced metal-clad polymer film, demonstrating its practical applications. Furthermore, he has developed single-layer polymer films that consist of specific weight percentages of polyimide, matting agents, and black colorants, achieving desired optical properties.

Career Highlights

Throughout his career, Alidedeoglu has worked with prominent companies such as DuPont Electronics, Inc. and Rohm & Haas Electronic Materials LLC. His experience in these organizations has allowed him to refine his skills and contribute to significant projects in the electronics and materials sectors.

Collaborations

Alidedeoglu has collaborated with notable colleagues, including Joseph Casey Johnson and Laila MacLaughlin. These partnerships have fostered a creative environment that has led to innovative solutions in their respective fields.

Conclusion

Husnu Alp Alidedeoglu's contributions to the field of polymer films and electronic devices highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to excellence and a forward-thinking approach in materials science.

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