Danville, CA, United States of America

Huong Nguyen


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 467(Granted Patents)


Location History:

  • San Ramon, CA (US) (2000)
  • Danville, CA (US) (1998 - 2003)

Company Filing History:


Years Active: 1998-2003

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5 patents (USPTO):Explore Patents

Title: Huong Nguyen: Innovator in Plasma Processing Technologies

Introduction

Huong Nguyen is a prominent inventor based in Danville, CA (US). She has made significant contributions to the field of semiconductor processing, particularly in plasma cleaning and chemical vapor deposition technologies. With a total of 5 patents to her name, her work has had a substantial impact on the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among her latest patents is a method of depositing a silicon-containing layer on a semiconductor substrate. This innovative plasma cleaning method involves introducing a cleaning gas comprising a fluorine-based gas into a chemical vapor deposition (CVD) chamber. A plasma is formed by exposing the cleaning gas to an inductive field generated by resonating a radio frequency current in an RF antenna coil. The method allows for in-situ cleaning of the chamber at high rates, effectively reducing equipment downtime, particularly in the cleaning of a plasma-enhanced CVD process chamber.

Another notable patent is for a method for high-density plasma chemical vapor deposition of dielectric films. This plasma processing system includes a processing chamber, a substrate holder, and a gas supply that directs gas towards the substrate. The system utilizes an RF energy source to energize the process gas into a plasma state, enhancing the deposition process. The design also incorporates a cooling mechanism for the primary gas ring during processing, ensuring optimal performance.

Career Highlights

Huong Nguyen is currently employed at Lam Research Corporation, where she continues to advance her research and development efforts in semiconductor technologies. Her work has been instrumental in improving the efficiency of plasma processing systems, which are critical in the manufacturing of modern electronic devices.

Collaborations

Throughout her career, Huong has collaborated with notable colleagues, including Brian K McMillin and Michael S Barnes. These partnerships have fostered innovation and have contributed to the successful development of her patented technologies.

Conclusion

Huong Nguyen's contributions to the field of plasma processing technologies exemplify her dedication to innovation in semiconductor manufacturing. Her patents reflect her expertise and commitment to advancing the industry, making her a key figure in the realm of semiconductor technology.

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