This inventor holds 1 USPTO granted patent. Top assignee: China Star Optoelectronics International (Hk) Limited. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: **Innovations by Hung-Wen Wei: Advancements in Plasma Enhanced Atomic Layer Deposition**
Introduction
Hung-Wen Wei is an innovative inventor based in Hsinchu Hsien, Taiwan. He has made significant contributions in the field of materials deposition technology, particularly through his work in plasma enhanced atomic layer deposition (PEALD). With a keen focus on improving manufacturing techniques, Wei's inventive ideas aim to enhance efficiency and lower costs in production processes.
Latest Patents
Hung-Wen Wei holds a notable patent titled "Operating method for a large dimension plasma enhanced atomic layer deposition cavity and an apparatus thereof". This invention provides an operating method designed to optimize the performance of large-volume manufacturing cavities used in PEALD. The innovation focuses on reducing the time required to fill the manufacturing gas, which enables the apparatus to switch precursors rapidly. This capability not only increases the thin film deposition rate but also minimizes manufacturing gas consumption and lowers overall production costs.
Career Highlights
Currently, Hung-Wen Wei contributes his expertise at China Star Optoelectronics International (HK) Limited, a company recognized for its advancements in optoelectronic technologies. His work there is instrumental in pushing the boundaries of what can be achieved through advanced deposition techniques, benefiting both the company and the broader industry.
Collaborations
In his professional endeavors, Hung-Wen Wei collaborates with esteemed colleagues, including Hung-Che Ting. This partnership fosters innovation and the exchange of ideas within their area of expertise, further enhancing the advancements in the field of atomic layer deposition technologies.
Conclusion
Hung-Wen Wei exemplifies the spirit of innovation and dedication to improving manufacturing processes through his inventive contributions. His patent showcases a commitment to enhancing efficiency and reducing costs in the realm of plasma enhanced atomic layer deposition. As the demand for advanced materials continues to grow, Wei's work will undoubtedly play a crucial role in shaping the future of this technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile