Hung-Ming Kuo

Title: Innovations of Hung-Ming Kuo

Introduction

Hung-Ming Kuo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 5 patents, Kuo has established himself as a key figure in advancing exposure methods and apparatuses.

Latest Patents

One of Kuo's latest patents focuses on an exposure method and exposure apparatus. In this method, a focus control effective region and a focus control exclusion region are established based on an exposure map and a chip area layout within an exposure area. The process involves measuring focus-leveling data over a wafer, where a photo resist layer is exposed with exposure light. When a chip area of multiple chip areas is located within the effective region of the wafer, it is included in the focus control effective region. Conversely, if any part of a chip area is located on or outside the periphery of the effective region, it is included in the focus control exclusion region. The focus-leveling is then controlled using the measured data from the effective region.

Career Highlights

Hung-Ming Kuo works at Taiwan Semiconductor Manufacturing Company Ltd., a leading organization in the semiconductor industry. His work has been instrumental in enhancing the precision and efficiency of exposure techniques used in chip manufacturing.

Collaborations

Kuo has collaborated with notable colleagues, including Jui-Chun Peng and Yung-Yao Lee, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Hung-Ming Kuo's innovative work in exposure methods and apparatuses has significantly impacted the semiconductor industry. His contributions continue to pave the way for advancements in technology and manufacturing processes.