Company Filing History:
Years Active: 2011-2015
Title: Innovations of Inventor Hung-Li Chang
Introduction
Hung-Li Chang is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 4 patents to his name, his work focuses on methods for fabricating semiconductor devices.
Latest Patents
Hung-Li Chang's latest patents include innovative methods for fabricating semiconductor devices. One of his patents describes a method that involves providing a substrate comprising a P-well. In this method, a low voltage device area and a high voltage device area are defined in the P-well. A photoresist layer is formed on the substrate, and a photomask comprising a shielding region is provided. The shielding region corresponds to the high voltage device area. The pattern of the photomask is transferred to the photoresist layer on the substrate through a photolithography process. Additionally, a P-type ion field is formed outside of the high-voltage device area by selectively doping P-type ions into the substrate using the photoresist layer as a mask. Another patent focuses on a method for fabricating a semiconductor device with increased breakdown voltage, utilizing similar techniques.
Career Highlights
Hung-Li Chang is currently employed at Vanguard International Semiconductor Corporation. His work at this company has allowed him to further develop his expertise in semiconductor technology and contribute to advancements in the field.
Collaborations
Some of his notable coworkers include Chih-Ping Lin and Pi-Kuang Chuang. Their collaboration has likely fostered an environment of innovation and creativity within their projects.
Conclusion
Hung-Li Chang's contributions to semiconductor technology through his patents and work at Vanguard International Semiconductor Corporation highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor devices.