Hung-Jung Hsu

Title: Innovations by Inventor Hung-Jung Hsu

Introduction

Hung-Jung Hsu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography, particularly in the semiconductor manufacturing industry. With a total of 3 patents to his name, Hsu continues to push the boundaries of technology.

Latest Patents

Hsu's latest patents include a "Lithography exposure system with debris removing mechanism." This innovative lithography system features an extreme ultraviolet (EUV) light source, a reticle stage, a reflection layer, and multiple light permeable protrusions. The EUV light source generates an EUV light beam, while the reticle stage holds a reticle facing downward. The reflection layer is positioned below the reticle stage, and the protrusions are formed on the reflection layer. Each protrusion has a bouncing surface that forms an acute angle with the downward direction, allowing a portion of the EUV light beam to pass through and be reflected to the reticle.

Another significant patent is the "Lithography exposure method with debris removing mechanism." This method involves placing a reticle over a reticle stage and generating a light beam by irradiating a droplet with a laser. The first portion of the light beam is projected over the light permeable protrusions on the reflection layer, directing it to the reticle.

Career Highlights

Hung-Jung Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work focuses on enhancing lithography processes, which are crucial for the production of advanced semiconductor devices.

Collaborations

Hsu collaborates with talented coworkers, including Chieh Hsieh and Tai-Yu Chen. Their combined expertise contributes to the innovative projects at their company.

Conclusion

Hung-Jung Hsu's contributions to lithography technology demonstrate his commitment to advancing the semiconductor industry. His innovative patents reflect his expertise and dedication to improving manufacturing processes.