Shenzhen, China

Huisi Wu

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Huisi Wu. Retrieved from https://idiyas.com/inventor/huisi-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Huisi Wu: Innovator in Optical Flow Estimation

Introduction

Huisi Wu is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of image processing and optical flow estimation. His innovative work has led to the development of a unique electronic device that enhances the accuracy of optical flow estimation.

Latest Patents

Huisi Wu holds 1 patent for his invention titled "Electronic device for estimating optical flow and operating method thereof." This patent describes a method of estimating optical flow by processing two images separately. The method involves extracting feature maps and generating attention feature maps that improve the estimation process.

Career Highlights

Huisi Wu is currently employed at Samsung Electronics Ltd., where he continues to push the boundaries of technology. His work focuses on developing advanced image processing techniques that have applications in various fields, including computer vision and artificial intelligence.

Collaborations

Throughout his career, Huisi Wu has collaborated with talented individuals such as Zhaohui Lv and Pei You. These collaborations have fostered an environment of innovation and creativity, leading to groundbreaking advancements in their respective fields.

Conclusion

Huisi Wu's contributions to optical flow estimation and image processing exemplify the spirit of innovation. His work at Samsung Electronics Ltd. and his patented technology are paving the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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