Huikan Liu

Title: Huikan Liu: Innovator in Lithography Model Calibration

Introduction

Huikan Liu is a notable inventor based in Fremont, CA, who has made significant contributions to the field of lithography model calibration. With a total of 2 patents to his name, Liu's work focuses on enhancing the precision and efficiency of lithographic processes.

Latest Patents

Liu's latest patents include innovative systems designed for multi-objective calibrations of lithography models. One patent describes a model calibration engine that determines a candidate lithography model set by initializing a population of parent candidate models and generating child candidate models. This process involves merging these models into a population, classifying them into tiers based on objective functions, and identifying a Pareto-optimal front for calibration. Another patent details a method for lithography model calibration using cache-based niching genetic algorithms. This method involves dividing original model candidates into groups, generating child model candidates through crossover, and iterating the process to derive new model candidates while maintaining diversity.

Career Highlights

Throughout his career, Huikan Liu has worked with prominent companies such as Mentor Graphics Corporation and Siemens Industry Software GmbH. His experience in these organizations has allowed him to develop and refine his expertise in lithography and model calibration.

Collaborations

Liu has collaborated with notable professionals in his field, including Konstantinos G Adam and Nicolas Bailey Cobb. These collaborations have contributed to the advancement of technologies in lithography and model calibration.

Conclusion

Huikan Liu's innovative work in lithography model calibration has established him as a key figure in the field. His patents reflect a commitment to improving lithographic processes through advanced modeling techniques.