The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Jan. 09, 2020
Applicant:

Mentor Graphics Corporation, Wilsonville, OR (US);

Inventor:

Huikan Liu, Fremont, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 99/00 (2006.01); G05B 19/4097 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4097 (2013.01); G03F 7/705 (2013.01); G05B 2219/32035 (2013.01); G05B 2219/35012 (2013.01); G05B 2219/45028 (2013.01); G05B 2219/45031 (2013.01);
Abstract

A system may include a model calibration engine configured to determine a candidate lithography model set from which to calibrate a lithography model according to multiple objectives, including by initializing a population of parent candidate models, generating child candidate models, merging the parent and child candidate models into a merged population, classifying the candidate models of the merged population into tiers of non-dominated fronts according to respective objective functions for the multiple objectives, determining a subset of the merged population based on the classified tiers, and identifying, as the candidate lithography model set, a Pareto-optimal front of the subset of the merged population determined based on the classified tiers. The system may also include a model selection engine configured to set a given candidate lithography model in the candidate lithography model set as a calibrated lithography model for simulating a lithographic process.


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